MCVD工艺制备光纤制造工艺课件

上传人:vosvybf****vycfil... 文档编号:240919412 上传时间:2024-05-17 格式:PPT 页数:23 大小:4.84MB
返回 下载 相关 举报
MCVD工艺制备光纤制造工艺课件_第1页
第1页 / 共23页
MCVD工艺制备光纤制造工艺课件_第2页
第2页 / 共23页
MCVD工艺制备光纤制造工艺课件_第3页
第3页 / 共23页
点击查看更多>>
资源描述
新型光纤材料与器件团队NOVEL OPTIC FIBERS AND DEVICES TEAMMCVD工艺关键技术新型光纤材料与器件团队NOVEL OPTIC FIBER光纤的四大制造技术?VAD(轴向汽相沉积)?OVD(外部汽相沉积)?MCVD(改进的化学汽相沉积)?PCVD(等离子体化学汽相沉积)光纤的四大制造技术?VAD(轴向汽相沉积)?OVD(外部汽MCVD工艺制备光纤制造工艺课件MCVD工艺简介工艺简介MCVD工艺简介MCVD工艺步骤1Recipe DevelopmentMain variables for each process steps are following:?Gas flows:bubbler carrier gas,O2,He,Cl2,SF6 etc.?Preform temperature?Carriage speed?Sootbox pressure?Ramping of relevant parametersMCVD工艺步骤1Recipe DevelopmentMMCVD工艺步骤工艺步骤2Tube preparationTypical MCVD production tube is constructed from three quartz tubes,which are welded together prior to MCVD process.?inlet tube:low quality quartz?substrate tube:high quality synthetic silica,forms final preform?exhaust tube:low quality quartz?sleeving tube:synthetic silicaMCVD工艺步骤2Tube preparationTypMCVD工艺步骤工艺步骤3Fire Polishing/EtchingPurpose:To clean tube outer and inner surface to improve preform quality.?Temperature:1850-2200C?Reactant flows:O2+fluorine source for etchingSF6+O2MCVD工艺步骤3Fire Polishing/EtchMCVD工艺步骤工艺步骤4Cladding and core depositionCladding deposition?Purpose:deposition of protection barrier for core.?Temperature:1900-2100oC?Typical reactant flows:SiCl4,?POCl3,O2,HeCore deposition?Purpose:deposition of refractive?index difference?Temperature:1900-2200oC?Typical reactant flows:SiCl4,?GeCl4,O2,HeMCVD工艺步骤4Cladding and core dMCVD工艺反应机理工艺反应机理SiCl4+O2=SiO2+2Cl2 GeCl4+O2=GeO2+2Cl24POCl3+3O2=2P2O5+6Cl2 4BCl3+3O2=2B2O3+6Cl2MCVD工艺反应机理SiCl4+O2=SiO2+2Cl2 热泳效应热泳现象热泳现象是指在温度梯度不为零的气体或悬浮体中,粒子向较冷区域运动的现象。热泳速度正比于温度梯度,而与粒径无关。热泳效应热泳现象是指在温度梯度不为零的气体或悬浮体中,粒子向MCVD工艺步骤工艺步骤5Collapsing?Purpose:to produce glass rod for jacketing and fiber drawing?Typically 2 to 5 forward and 1 backward steps?Temperature:2000-2400oC?Chlorine used as a drying agentMCVD工艺步骤5Collapsing?Purpose:MCVD工艺步骤工艺步骤5 Preform analysis?dimensional and optical parameter evaluation.?important process and quality control toolMCVD工艺步骤5Preform analysis?diMore preform analysis?Preform dimensionsPreform,cladding and corediameters from different anglesand longitudinal positions?Refractive indicesSubstrate tube,cladding and corefrom different longitudinal positions?Cutoff,MFD,Chromatic dispersion?Preform non-circularity(preform,cladding,core)?Preform concentricity(preform,cladding,core)More preform analysis?Preform MCVD工艺步骤6 Rod in tube sleeving?Purpose:enlarge preform size to improve MCVD productivity?Typical final preform size:40 to 80 mm?Temperature:2000C?Vacuum suction between rod and tube to accelerate joining processFiber drawingMCVD工艺步骤6Rod in tube sleevinMCVD设备系统主要组成设备系统主要组成1.Lathe 2.Gas Control System 3.PC/PLC Control System 4.Gas&Water Supply5.Extract Systems.MCVD设备系统主要组成1.Lathe SGC MCVD SGC MCVD MCVD Lathe?Oxy-hydrogen burner?Pyrometer?Flame detectorMCVD Lathe?Oxy-hydrogen burnerGas Control and supply System?Silicon Tetrachloride(SiCl4)Supply?Germanium Tetrachloride(GeCl4)Supply?Phosphoryl Chloride(POCl3)Supply?Boron trichloride(BCl3)Supply?Lathe Hydrogen&Oxygen Supply?Sulphur Hexafluoride(SF6)Supply?Chlorine Supply?Oxygen Supply?Helium Supply?Nitrogen Supply?Pneumatics Supply?Drybox temperature controlGas Control and supply System?Gas StationGas StationExtract Systems1.Gas inlet2.Jet stream column3.Reduction tank4.Neutralization tank5.Absorption column6.Fresh water feed7.Chemical feed8.Waste water discharge9.Pure gas outletExtract Systems1.Gas inlet2.Gas scrubberJet stream tankOver 90%of silica is collected to the350l jet stream tank.NaOH and Na2S2O3 solutions areautomatically added to the tank tokeep the pH in the tank between 8 and8.5 and Redox potential between-50and+200mV.The washed gas is directed to Neutralization tankthrough a mist eliminator.Jet stream tank receives continuous15-40 l/h overflow from Neutralization tank.Gas scrubberJet stream tankOGas scrubber Neutralization tank?The washed gas from stage 1 is?directed to the stage 2 through a setof dampers and mist eliminator(chevron type).?pH of stage 2 tank is kept between10 and 11 to ensure efficient?neutralization of the HCl gas.?HCl+NaOH-NaCl+H2O?Cl2+2NaOH-NaCl+NaClO+H2OGas scrubberNeutralization t新型光纤材料与器件团队NOVEL OPTIC FIBERS AND DEVICES TEAM谢谢!谢谢!新型光纤材料与器件团队NOVEL OPTIC FIBER
展开阅读全文
相关资源
相关搜索

最新文档


当前位置:首页 > 办公文档 > 教学培训


copyright@ 2023-2025  zhuangpeitu.com 装配图网版权所有   联系电话:18123376007

备案号:ICP2024067431-1 川公网安备51140202000466号


本站为文档C2C交易模式,即用户上传的文档直接被用户下载,本站只是中间服务平台,本站所有文档下载所得的收益归上传人(含作者)所有。装配图网仅提供信息存储空间,仅对用户上传内容的表现方式做保护处理,对上载内容本身不做任何修改或编辑。若文档所含内容侵犯了您的版权或隐私,请立即通知装配图网,我们立即给予删除!