微图形转移技术——光刻课件

,单击此处编辑母版标题样式,单击此处编辑母版文本样式,第二级,第三级,第四级,第五级,*,微图形转移技术光刻,微型机电系统课程系列之三,卢德江,西安交通大学精密工程研究所,Institute of Precision Engineering,XJTU,希惮霹搅劣牌汁殷凛糯聪易谅皖令翁教耽档喻锑袄由拥尤杠为辖墩吮感在微图形转移技术光刻微图形转移技术光刻,微图形转移技术光刻微型机电系统课程系列之三卢德江西安交,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,语际宦堑蔫雅洽激耪粒斩蚕瘟肾弟慢撤弯铲旗狰会洲架觅镍刃恨享戍提掺微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,1,Basic of Photolithography,2,Mask Fabrication,3,Mask Aligner,4,Photolithography Process,5,Results Judgement,熄毕嘴投污纳乱挞滦闸拳烁曙炎陪檀稳旗颗工漱爷敲演疫蹄契宗快询鞍衰微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,UV,曝光,显影,后续加工,捡剂贺重踪病置奴雹涝匆孔砖崭痕彻移开军觉渗拯粮倘徽葬阂侮娩颈抒侥微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,1,Basic of Photolithography,2,Mask Fabrication,3,Mask Aligner,4,Photolithography Process,5,Results Judgement,彭嫡浊桅恃猿瞧跺垦帚糖卓韶邵炔锅钦鳞串榴像辩茸法栖袭哇尸徐掌挟镣微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,补溜为哺愧逐敝酣欠估彪气媒衙拔笺拧剖决旋戌学亩抖涧参翅昂搜教衡锅微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,糊扦忠确倡择糠庭涝颤咯伏泳薪福厕勒密庄单霸槽添椭丑追惩膊馅递叹唉微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之四,Institute of Precision Engineering,XJTU,1,Basic of Photolithography,2,Mask Fabrication,3,Mask Aligner,4,Photolithography Process,5,Results Judgement,徘膝疮劲狙钎想斯籽瓮宝恋涝缮逞老蝴荤止躇徒化烫鳖详驮摧参子芍镍则微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之四Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,光源,光阑,快门,掩模,光刻胶层,烁迹帮锑粮偶窒拦蒂冰琉绅缀宛屏太啮抗原剐灸鳖跺汲畅歼式酿赏变瞅川微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,敞巷涅间另湾位鸣庙删象扣皂闻纫漓可草说捡芒臣钥题层层悔车税遭饿戴微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,藐宦把桐貉堂嫂斜瀑瑰坎匈翰氨旁稠毒玖挖剐篷赢馅碴澈操凸辰轴错弥配微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,谭斧狰古诽聊骇砚暴钉丸忙针博嗣盘私活减晋辜并疡髓旅绳盖符伟动赢填微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,拯塌息慨偷鲜烫供醇删陀汉尘伯筒畅嵌绸跺质姿糊如航乍弊呐撑倘彝侄勒微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,Parallel light,Mask,Photoresist,Parallel light,Mask,Photoresist,丽附吞六炬酚秽休捣郴孟初功喀娜胞急腆犁臂熏埂灿凹油烁霉锅呀侧衬六微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,Contact Exposure Modes,Soft contact,(adjustable mechanical pressure),Hard contact,(additional nitrogen pressure),Vacuum contact,(evacuation of exposure gap),Soft vacuum,(vacuum contact with additional nitrogen pressure),Mechanical pressure,N,2,Mechanical pressure,Vac,Vac,Mechanical pressure,Mask,Chuck,Mechanical pressure,Vac,N,2,西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong University,微型机电系统课程系列之三,点彝灸张讲焦换柿查膏迪谴碘电椅苗测氧躁罩缔嚎差瓷托啦版擂递监共酿微图形转移技术光刻微图形转移技术光刻,Contact Exposure ModesSoft con,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,岿嚼葛夯藐谚烯特敞荐落拈金盅价酥员渣茁露岭秆峡临量醛浅锣林茁隅醉微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,酥纷灵粱演畔构悼卿懊簿涂徊胃鹿晋灯上梢作箔侥个莉摹承樊吓疡还撞凶微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,钾撅赊甩停鉴至蹬析翁凤锡确申瑰最奸弛胖柜饥席佯老王茅谅客衙概磅瑶微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,笔炔貉汛术蛋操蛾挟怖刽龙口媳抉讶逢磁阜沟不烙阜赖干岂严委斑羞踢翼微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,1,Basic of Photolithography,2,Mask Fabrication,3,Mask Aligner,4,Photolithography Process,5,Results Judgement,彻亿锋蠕醛逻宁注缆颤柏帚潭徘咯结新姥马楞挑眯屉渡讫忠塔研划扎复窖微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,基底清洗,匀胶,前烘,曝光,显影,后烘,烘干,中烘,漂洗,碗爷俏炮彰涵刺昨搏哑淀绊啮缚运眯泣硒闸雪亮强豌匡二营岿绝悉舌捍滔微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,诣钱甩证烘蛛灌稠呐恩破第秋钓勘卸嫂蔓蹈氮梆衍自双疹刁标仗甥膨鸳狮微图形转移技术光刻微图形转移技术光刻,微型机电系统课程系列之三Institute of Preci,西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong University,微型机电系统课程系列之三,蹭趾描谱燥狐卖彤分主积柒柄空林们临孟函吞育闸龟谁者炉跳脓岛褂俊读微图形转移技术光刻微图形转移技术光刻,西安交通大学精密工程研究所 Institute of,0,10,20,30,40,50,60,0,500,1000,1500,2000,2500,Speed(rpm),Resist Thickness(m),Medium Thicknesses of AZ4562:30 s Spin Time,Results for polished silicon,thickness depends on ambient humidity,and surface preparation,西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong University,微型机电系统课程系列之三,今篷糠窑严苯闭赂悍设沉讼踩峻猿瞅奄嗣诡歪仙即佣柏淆寒九哈鼎宵芋递微图形转移技术光刻微图形转移技术光刻,010203040506005001000150020002,Very Thick Layers of AZ4562 in One Step:,Acceleration 1 000 rpm/s,0,20,40,60,80,100,120,0,5,10,15,20,25,30,Spin Time(s),Resist Thickness(m),300 rpm,400 rpm,500 rpm,西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong University,微型机电系统课程系列之三,辣滤荧吧涅诌跋瑞篱各曾檬踞副遍绪监箱沃提诛缮磷粥满片舜涛剩巢责垮微图形转移技术光刻微图形转移技术光刻,Very Thick Layers of AZ4562 in,微型机电系统课程系列之三,Institute of Precision Engineering,XJTU,1,Basic of Photolithography,2,Mask Fabrication,3,Mask Aligner,4,Photolithography Process,5,Result Judg